Ultra high molecular weight polyethylene porous membrane SUNMAP ™

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Ultra high molecular weight polyethylene porous membrane SUNMAP ™

The porous membrane has breathability without changing the properties of ultrahigh molecular weight polyethylene. “SUNMAP ™” Nitto Denko Porous polymer membranes were developed by using a special sintering technique. This porous film has a new characteristic such as breathability and low friction coefficient, and maintains excellent characteristics of high molecular weight polyethylene such as chemical resistance, abrasion resistance and viscosity removal. With excellent machining performance, there is a wide range of applications, and the range of application will expand.

Category:

Wear Resistant Material

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  • Product Description
  • Product parameters
  • Product application
  • Characteristic:
    1. The porous membrane adopts an open grid, which has good breathability and moisture permeability.
    2. By forming a porous film of ultra-high molecular weight polyethylene with good wear resistance and low friction coefficient, it has good sliding properties.
    3. It has chemical stability and is almost unaffected by any chemicals such as acids and bases.
    Thanks to its excellent processing performance, it can be used for heat sealing, punching, and filling.

  • Characteristic:

    Product Code

    SUNMAP LC-T

    Thickness [mm]]

    0.5

    Average pore size [µ m]

    17

    Breathability [sec/100 cm3]

    1.4

    Porosity [%]

    30

    Tensile strength [Mpa]

    12

    Extension rate [%]

    90

    Hardness [Shore D]

    48

    Surface roughness (Ra) [µ m]

    2.0

    Friction coefficient

    0.1

  • Application:
    1.【SUNMAP LC】
    Suitable for absorbing/fixing glass materials, such as LCD.
    2.【SUNMAP LC-T】
    SUNMAP LC anti-static type.
    3.【SUNMAP HP】
    Suitable for absorbing/fixing ceramic substrates.

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